a si tft lcd panel factory

The most common semiconducting layer is made of amorphous silicon (a-Si). a-Si  thin film transistor - liquid crystal display (TFT-LCD) has been the dominant technology for the manufacturing of active matrix TFT-LCD for over 20 years. a-Si is a low cost material in abundant supply.

a-Si is a low cost material in abundant supply. However, the electron mobility of a-Si is very low (around 1cm2/Vs) and can’t physically support high refresh rates such as the 240Hz needed for HDTV. Due to their high electron mobility, new materials such as metal oxide (MO) and low temperature polysilicon (LTPS) are now replacing a-Si to manufacture the industry’s two main types of screens: LCD and organic light-emitting diode (OLED) displays.

According to LCD (Liquid Crystal Display) technology and LCD materials, mobile phone LCD assemblies can be classified into 2 types: TFT (Thin Flim Transistor) and OLED（Organic Light-Emitting Diode). TFT display needs with backlight, but OLED is light-emitting, each pixel is creating its own light.

For Original iPhone LCD, 5-8 plus and Xr, 11 is TFT, X-13 Pro Max is OLED (except XR and 11). But in mobile phone aftermarket, there are too many different types and different qualities, which makes customers confused.

What is in-cell? What is OGS or " with TP"? What is COF? What is COG? What is OEM? What is FOG? What is Original Change Glass? What is IPS? What is LTPS? What is a-Si?

HTPS with small size, high precision, and high contrast. Most used in magnified display products. Such as projectors, projection TVs, etc. And cannot be used as a mobile phone display, so we don"t talk about it here.

IGZO has 20–50 times the electron mobility than a-Sin. IGZO only has been licensed to Samsung Electronics and Sharp. However, it was Sharp who first implemented IGZO into their smartphones (Aquos Phone Zeta SH-02E), tablets, and 32-inch LCDs. IGZO for mobile phones is only Sharp. Almost all mobile phones on the market didn"t use IGZO.

Because the electrons deflect the liquid crystal molecules through the transistor. Electron mobility fundamentally determines the refresh rates of the TFT device. The smaller mobility, the slower transmission of holes and electrons, and the slower response rate. Can"t physically support high refresh rates.

In order to improve the response performance, can increase transistor size to enhance the migration, but this will lead to the extra TFT device that will occupy the display area pixel area. Therefore, the larger unit transistor area, the single-pixel occupy area is smaller(Pixel Aperture Ratio ), resulting in lower brightness.

Secondly, because the volume cannot be smaller, then the number of pixels per unit area is limited, which means the pixel density is small, which is what we call PPI is low, resulting in low resolution. The image needs to be zoomed, the original image data is lost, and resulting in the blurred image effect.

As we can see electron mobility of a-Si is very low (0.5-1cm2/Vs). But LTPS can deliver a hundred times the mobility than a-Si, and a much higher aperture ratio and PPI is much higher than a-Si resolution.

Compared with LTPS，a-si TFT have those "weakness":a-Si with so much low resolution and low definition. a-Si is 720*1280 with a very blurred display effect.

a-Si with so much bad display performance, but why are there still so many manufacturers producing phone LCDs with a-Si, or why do the customers willing to use a-Si LCD for their phone?

LCDs business has too much competition and wholesalers want to make more profit, they keep pushing suppliers to make LCDs at lower prices. So some of the suppliers start to produce aftermarket phone displays with a-Si to match customers" lower price requirements.

The customers with asymmetric information. End-Users don"t know how to distinguish LCDs qualities. Some of them just chase the price but not quality. That is another reason wholesalers want a lower price.

Now in the market a-Si LCDs for iPhone is TFT with TP but not in-cell. Our ZY a-Si will be in-cell not just TFT with TP. ZY a-Si incell for Xr and 11 ready now, please to get more details.

For more details or questions about in-cell and TFT with TP or about phone LCD display. Please click here to get more information, or Long press and scran the QR code to add me.

Samsung Display, one of the leading amorphous silicon (a-Si) TFT LCD manufacturers for the past 20 years, is shutting down its first G7 line, Line 7-1, from as early as the end of July and there are rumors of a few more fab closures to come. Its a-Si TFT LCD footprint is expected to shrink dramatically over the next few years with potentially just one a-Si fab in operation in 2018 to serve its market-leading TV business.

Panasonic LCD is also rumored to be shutting down most or all of its G8.5 line. Based on the near term decline in a-Si TFT LCD capacity, Credit Suisse upgraded AUO and Innolux on this news and their shares surged.

Samsung’s Line 7-1, which began operation in October 2004 and production in May 2005, is rumored to be shutting down from the 30th July through the end of the year. It has a unique glass size (1,870 x 2,200mm), which was the largest in the world at the time of its introduction and is optimized for both 40” and 46” LCD TV panel production. It was also the site of the Samsung-Sony joint venture, S-LCD, established in April 2004. This line enabled Samsung and Sony to rapidly take share from smaller G6 fabs optimized for 32” and 37” panels. During that time, the two companies competed aggressively in retail while establishing 40” and 46” as mainstream sizes. The JV with Sony ended in 2011. S-LCD also built an 8th gen fab that began production in Q3’07, and Samsung built a second G7 line (L7-2) on its own, with even more capacity at over 170,000 substrates per month. L7-2 began production in Q3’08.

Displays are already a weak spot in Samsung’s financial performance. The category caused the device solutions division to be the only one to suffer a loss among all major divisions within Samsung in Q1’16, and its revenues of KRW6 trillion ($5.2 billion) were the lowest in two years. The display division alone posted an operating loss of KRW270 billion ($233 million) in Q1’16 resulting in an operating margin of -4.4%. While Samsung has a number of technology and capacity advantages in OLEDs for mobile displays, its a-Si TFT LCD business has matured and is increasingly becoming commoditized, as new entrants from China with government support are taking share. In addition, most of the a-Si TFT LCD market segments have become stagnant or are in decline, which points to more losses given the growing Chinese competition. On the other hand, OLEDs and flexible OLEDs are poised for rapid growth as they take share. As a result, it makes good business sense for Samsung to exit much of the a-Si TFT LCD market.

Line 7-2, newer and larger than 7-1, is also rumored to be for sale and is expected to be shut down in 2017, but probably depends on profitability. Line 7-2 has been producing 3-4 million 40” panels and 300,000 75” panels annually, as well as monitor panels. Twinstar is also a potential customer for the manufacturing equipment and this line may also be utilized for OLED production in the future.

Samsung is expected to begin shipping for the first OLED iPhone in volume from Q3’17, with input capacity from the modified Line 7 ramping up to between 90,000 and 120,000 substrates per month. Apple is expected to purchase 70 million OLED panels in 2017, according to sources.

That is not all, however. Line 6, Samsung"s last 5th gen line with 1,100 x 1,300mm substrates and around 190,000 substrate per month capacity, is also expected to be shut down, according to industry insiders. That line, which features a-Si and oxide TFT LCD production, has been producing tablet, notebook PC and LCD monitor panels. Those markets have also been hit by stagnant demand, growing competition from China, commoditization and declining margins. This line is expected to be shut down between the end of 2016 and 2017. Line 6 is predicted to be converted to a semiconductor facility, making application processors for smartphones and tablets.

If Samsung closes down Line 6 and Lines 7-1 and 7-2, its a-Si production will be down to just two G8.5 fabs: one in Suzhou, China and one in Tangjong, Korea. The Suzhou fab, ramping to over 100,000 substrates per month, is also rumored to be a candidate for sale with Chinese and Indian TFT LCD suppliers as potential customers. If Samsung licenses its latest a-Si TFT LCD or oxide TFT LCD technology, that would certainly make the sale more attractive. This means Samsung would have just one a-Si TFT LCD fab: Line 8.

I believe Line 8 will be sufficient for Samsung to support its internal TV brand with leading edge panels for the TV market as it has a monthly capacity of 400,000 2,200 x 2,500mm (G8.5) substrates. Samsung’s TV business would likely continue to outsource its low-end panels for its TVs to other LCD manufacturers and focus this fab on higher margin products such as 8k, HDR, QD WCG, etc. I cannot see Samsung abandoning LCD TV panel production until it believes OLEDs are cost effective enough to takeover the mid-range high end of the TV market. This likely means not until OLED materials can be inkjet printed, Samsung is still likely to focus all of its TV panel production on LCDs.

If this occurs as described, Samsung Display"s output of 42" and larger panels would be LCD, and sub-42" would be OLED, although it may not have much production between 15" and 40". This would be an amazing, but expected, transformation given the supply/demand and profitability outlook for the a-Si market.

Panasonic is also following Samsung’s lead. It is expected to reduce the glass input of its G8.5 line from around 50,000 per month to just 10,000 per month by September. Given the limited scale and cost effectiveness of this Japanese factory and the loss of share of Panasonic"s TV brand in many regional TV markets, the company is better off purchasing panels from LG and lower cost Chinese suppliers. Otherwise it would be trying to run a high cost fab in Japan, in a market where commoditization is becoming increasingly common and a large wave of new, lower cost capacity from China is on its way. The company may keep 10,000 of capacity for some period for Panasonic-branded products, but it is hard to imagine operating a fab at just 10,000 per month for long, as the lack of volume will further increase costs relative to other higher volume players.

Interestingly, with both Samsung and Panasonic reducing their a-Si capacity in the near term, Credit Suisse has upgraded its outlook for AUO and Innolux to outperform, and both companies have seen significant share price increases as a result. Credit Suisse indicated that the closure of L7-1 will reduce supply by 12 million 40” panels - or 1/3 of the 40” market - which will tighten supply in the 40”-43” market and produce a better pricing environment. AUO’s earnings per share (EPS) was raised from NT$10.20 to NT$13 ($0.32 - $0.40), while Innolux’s EPS was raised from NT$10.10 to NT$14 ($0.31 - $0.43). Both companies" stock prices have taken off, with AUO’s stock price rising by 22% in the US in three days.

As Japanese and Korean players take more a-Si capacity offline, it will create a better environment for the Taiwanese and Chinese suppliers, enabling the market to better digest all the new capacity being brought online in China. However, there is a tremendous amount of capacity coming and much of this older capacity from Samsung and Panasonic may get sold and reintroduced. As pointed out at SID 2016, by 2019 China is expected to have:

2016 and 2017 are expected to be back-to-back years of over $12 billion in LCD/OLED equipment spending. Unless these fabs struggle with their ramp and their yields, the a-Si market will continue to be oversupplied although conditions should improve in the 40”-43” market in the second half of 2016.

Rather than battle it out with government-subsidized Chinese players, Samsung appears to be accelerating its exit of the increasingly commoditized a-Si TFT LCD market. This should please its shareholders, especially if it can sell all its old equipment and license its a-Si technology for a royalty, but will be harmful to some of its suppliers. It is also likely to protect its TV business by holding onto its most competitive fab, but will increasingly become an OLED company. Interesting questions as a result of these moves include:

Will LG Display follow Samsung’s lead and accelerate the closure of its older a-Si lines, or will it slug it out against the new wave of Chinese capacity?

A couple of days after this article was originally posted, it was claimed - and later denied by a company official - that Samsung will move its a-Si TFT LCD operations out of Samsung Display and into Samsung Electronics. Such a move aligns perfectly with its intention, indicated above, to close its a-Si fabs as in a couple of years its a-Si TFT LCD operations may be limited to providing panels to its TV business. - Ross Young

Ross Young is the CEO and Founder of Display Supply Chain Consultants. He also serves on the Board of Directors of publicly traded touch sensor manufacturer UniPixel and diamond semiconductor developer Akhan Technologies. He previously founded DisplaySearch and served as its CEO from 1996 - 2007 where he launched most of their categories of coverage. He has also held executive positions at Samsung LCD and IMS Research.

Flat-panel displays are thin panels of glass or plastic used for electronically displaying text, images, or video. Liquid crystal displays (LCD), OLED (organic light emitting diode) and microLED displays are not quite the same; since LCD uses a liquid crystal that reacts to an electric current blocking light or allowing it to pass through the panel, whereas OLED/microLED displays consist of electroluminescent organic/inorganic materials that generate light when a current is passed through the material. LCD, OLED and microLED displays are driven using LTPS, IGZO, LTPO, and A-Si TFT transistor technologies as their backplane using ITO to supply current to the transistors and in turn to the liquid crystal or electroluminescent material. Segment and passive OLED and LCD displays do not use a backplane but use indium tin oxide (ITO), a transparent conductive material, to pass current to the electroluminescent material or liquid crystal. In LCDs, there is an even layer of liquid crystal throughout the panel whereas an OLED display has the electroluminescent material only where it is meant to light up. OLEDs, LCDs and microLEDs can be made flexible and transparent, but LCDs require a backlight because they cannot emit light on their own like OLEDs and microLEDs.

Liquid-crystal display (or LCD) is a thin, flat panel used for electronically displaying information such as text, images, and moving pictures. They are usually made of glass but they can also be made out of plastic. Some manufacturers make transparent LCD panels and special sequential color segment LCDs that have higher than usual refresh rates and an RGB backlight. The backlight is synchronized with the display so that the colors will show up as needed. The list of LCD manufacturers:

Organic light emitting diode (or OLED displays) is a thin, flat panel made of glass or plastic used for electronically displaying information such as text, images, and moving pictures. OLED panels can also take the shape of a light panel, where red, green and blue light emitting materials are stacked to create a white light panel. OLED displays can also be made transparent and/or flexible and these transparent panels are available on the market and are widely used in smartphones with under-display optical fingerprint sensors. LCD and OLED displays are available in different shapes, the most prominent of which is a circular display, which is used in smartwatches. The list of OLED display manufacturers:

MicroLED displays is an emerging flat-panel display technology consisting of arrays of microscopic LEDs forming the individual pixel elements. Like OLED, microLED offers infinite contrast ratio, but unlike OLED, microLED is immune to screen burn-in, and consumes less power while having higher light output, as it uses LEDs instead of organic electroluminescent materials, The list of MicroLED display manufacturers:

Sony produces and sells commercial MicroLED displays called CLEDIS (Crystal-LED Integrated Displays, also called Canvas-LED) in small quantities.video walls.

LCDs are made in a glass substrate. For OLED, the substrate can also be plastic. The size of the substrates are specified in generations, with each generation using a larger substrate. For example, a 4th generation substrate is larger in size than a 3rd generation substrate. A larger substrate allows for more panels to be cut from a single substrate, or for larger panels to be made, akin to increasing wafer sizes in the semiconductor industry.

2015, sold to giantplus and tce photomasks, gen 3 still operated by giantplus, gen 4 line sold to giantplus, equipment sold and line demolished, remainder operated by tce

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The present invention relates to a method of manufacturing a TFT array panel for a LCD. More particularly, the selective deposition and photo-resist lift-off techniques are used to implement the method of manufacturing a TFT-LCD array panel. By using the method for manufacturing a TFT-LCD array panel according to present invention, it can reduce and shorten the manufacturing process.

Liquid crystal displays have the advantages of small volume, light weight, low power consumption, low radiation, excellent image quality, broad applications, and are widely applied in the consumer electronic products or computer products, such as medium to small portable TVs, mobile phones, camcorders, notebook computers, desktop computers and projection TVs, etc. However, the mass cost causing from manufacturing LCDs is a key for the development in the LCD field. In order to overcome the cost problem, most companies and producers focus on the issue of reducing manufacturing cost. The biggest portion of the total cost in a LCD is on the manufacturing process of the TFT-LCD array panel. According to above description, the present invention is to provide a method for simplifying the TFT-LCD array panel manufacturing process. Further, it can achieve the cost reduction thereto shorten the manufacturing process.

According to the conventional method for manufacturing a TFT-LCD array panel, the layout of the panel circuit has to be implemented through at least four masking processes. However, the more masking processes, the more manufacturing costs. In other words, it means the more exposing lithography and etching processes need to be processed. The steps can cause serious effect on the reliability of the components. Therefore, the present invention is to provide a method for manufacturing a TFT-LCD array panel. More particularly, the method uses a selective deposition process to implement. The metal wire can be formed by using the selective deposition process. The process with circuit layout can alternate the conventional technique which of using more masking process to form the metal wire with multi-layer. It, therefore, can simplify and shorten the manufacturing process.

Besides, the metal deposition and photo-resist lift-off steps are further used in the consequent process of the transmission line. By using the present invention, it provides a method of manufacturing a TFT-LCD array panel. Further, it can avoid the damage risk in the operational channel while performing an etching process.

It is an object of the present invention to provide a method for manufacturing a TFT-LCD array panel. More particularly, a selective deposition method is used herein. It can reduce the numbers of masking processes thereto implement the growth of the low resistance metal wire.

It is another object of the present invention to provide a method of manufacturing a TFT-LCD array panel. More particularly, a lift-off technique is used in the method, and also applied in the manufacture of any metal conducting layer. The present invention can be illustrated as shown in the growth of the second metal wire. This can, therefore, reduce the cost of etching process. Furthermore, it can avoid the damage risk in the operational channel while performing etching process.

More, one of the main objects of the present invention is to provide the circuit of a TFT-LCD array panel. More particularly, the conducting metal layer is formed by using a low-resistance metal. It can improve the RC delay effect while happening in a big area panel.

For a more complete understanding of the present invention and for further advantages thereof, reference is now made to the following description taken in conjunction with the accompanying drawing, in which:

FIG. 1 bis one of the preferred embodiments of the present invention showing the deposition method used to form a dielectric layer and an A-Si layer, or a poly-Si layer;

FIG. 1 dis one of the preferred embodiments according to the present invention showing a liquid crystal contact window formed by an etching technique;

The present invention is to provide a method for manufacturing a TFT-LCD array panel. Please referring to FIG. 1 a, it is one of the preferred embodiments of the present invention showing a metal conducting wiring layout. In the first masking process, a transparent conducting electrode material is formed on the substrate 10, and the gate electrode 21, a transparent conducting electrode 23, and a storage capacitor electrode 22 are defined. Then, the graph of the transparent conducting electrode and the layouts of the gate electrode and the storage capacitor electrode are independent. According to the character of connection between the gate electrode and the storage capacitor electrode, the selective deposition method is used to deposit a low-resistance metal or a multi-layer metal wiring layer with metal diffusion passivation. The deposited metal material herein is composed of the low resistance metal, such as Al, Cu, Ag, Mo, Cr, Ti, W, or other alloy materials. The selective deposition method uses the selective conducting current to deposit the low-resistance metal on the right position of the gate electrode, the storage capacitor electrode. Therefore, it does not require extra masking process to define the first metal wire. The transparent conducting electrode layer can be made of ITO or IZO.

Accordingly, please referring to FIG. 1 b, a dielectric layer, an A-Si layer and a poly-Si layer are deposited as shown in the figure. Further, a dielectric layer 30, and an A-Si layer 40 and a poly-Si layer 50 are deposited in order, and are covered on the substrate 10, the gate electrode 21, the storage capacitor electrode 22 and the transparent conducting layer 23. Then, performing the second masking process. Please referring to FIG. 1 c, it is one of the preferred embodiments according to the present invention showing the contact window in the masking process. Firstly, photo-resists 501, and 502 are used to shield the outside of the transparent conducting electrode 23. Then, the contact window 24 is defined in the masking process. Please referring to FIG. 1 d, it is one of the preferred embodiments according to the present invention showing the contact window formed in the etching process. Then, the photo-resists 501, 502 are removed. More, the deposition method forming an A-Si layer, a transparent conducting electrode, or a gate electrode can use PVD, low pressure CVD, or plasma enhanced CVD to implement.

Further, the source electrode and the drain electrode are defined. Please referring to FIG. 1 e, it is one of the preferred embodiments according to the present invention showing the source electrode and drain electrode. The photo-resists 511, 231 are used to define the source electrode and the drain electrode in the third masking process. Then, performing metal layer deposits with a low-resistance metal or a diffusion material, but not removes the photo-resists 511, 231. Please referring to FIG. 1 f, it is an example of the present invention showing the metal deposition process, herein said metal is Cu. Cu is deposited on the photo-resists 61, 62 and on the place 60 without photo-resist covering.

Further, it presents a photo-resist lift-off process. Please referring to FIG. 1 g, it is one of the preferred embodiments according to the present invention showing a photo-resist lift-off process for implementing the deposition of the second metal wiring. Then, it uses the poly-Si layer 50 with etching technique to block the channel of the source and drain electrodes thereto the operational channel 411. Please referring to FIG. 1 h, it is one of the preferred embodiments showing the operational channel according to the present invention. The second metal wire can be made of the low-resistance metal materials, such as Al, Cu, Ag, Mo, Cr, Ti, W, or the induced material such as diffusion, and adhesion with multi-layer structure of the metal material.

Finally, the fourth masking process is discussed herein. The passivation layer 70 of the deposition component can be made of SiO2or silicon nitride. Please referring to FIG. 1 i, the passivation layer is shown herein. In the final masking process, the liquid crystal contact window 24 is formed to implement the TFT-LCD array panel according to the present invention as shown in FIG. 1 j.

For further description, the present invention is to provide a method of manufacturing a TFT-LCD array panel. The method can be applied in the pixel electrode circuit of a TFT-LCD array panel. Please referring to FIG. 2, it presents the circuit layout of the pixel electrode. It comprises a transparent conducting electrode 23, a gate electrode 21, and a storage capacitor electrode 22. Also, they are formed on the substrate 10 in the first masking process. Then, using the selective sputtering method deposits the first metal wires 211, 221. Further, the contact window of the transparent conducting electrode is implemented in the in the second masking process. More, the depositions of the second metal wires 63 64, 65 are implemented in the third masking process. Finally, the deposition of the passivation layer 70 is implemented for forming a pixel electrode.

Furthermore, the present invention relates to a method of manufacturing a TFT-LCD array panel. The transparent conducting metal layer is defined in the first masking process. More, the low-resistance gate electrode, the metal wiring layout of the storage capacitor electrode is implemented by the selective deposition method.

Further, the present invention provides a method of manufacturing a TFT-LCD array panel, wherein the metal wire of the second layer is as a hard mask to process in the operational channel, and does not require extra masking process to implement.

In conclusion, the present invention meets novelty, improvement, and is applicable to the industry. It, therefore, meets the essential elements in patentability. There is no doubt that the present invention is legal to apply to the patent, and indeed we hope that this application can be granted as a patent.

Although the present invention has been described in detail with respect to alternate embodiments, various changes and modifications may be suggested to one skilled in the art, and it should be understood that various changes, suggestions, and alternations can be made hereto without departing from the spirit and scope of the invention as defined by the appended claims.

A not-for-profit organization, IEEE is the world"s largest technical professional organization dedicated to advancing technology for the benefit of humanity.

A not-for-profit organization, IEEE is the world"s largest technical professional organization dedicated to advancing technology for the benefit of humanity.

TFT-LCD was invented in 1960 and successfully commercialized as a notebook computer panel in 1991 after continuous improvement, thus entering the TFT-LCD generation.

Simply put, the basic structure of the TFT-LCD panel is a layer of liquid crystal sandwiched between two glass substrates. The front TFT display panel is coated with a color filter, and the back TFT display panel is coated with a thin film transistor (TFT). When a voltage is applied to the transistor, the liquid crystal turns and light passes through the liquid crystal to create a pixel on the front panel. The backlight module is responsible for providing the light source after the TFT-Array panel. Color filters give each pigment a specific color. The combination of each different color pixel gives you an image of the front of the panel.

The TFT panel is composed of millions of TFT devices and ITO (In TI Oxide, a transparent conductive metal) regions arranged like a matrix, and the so-called Array refers to the region of millions of TFT devices arranged neatly, which is the panel display area. The figure below shows the structure of a TFT pixel.

No matter how the design of TFT display board changes or how the manufacturing process is simplified, its structure must have a TFT device and control liquid crystal region (if the light source is penetration-type LCD, the control liquid crystal region is ITO; but for reflective LCD, the metal with high reflection rate is used, such as Al).

The TFT device is a switch, whose function is to control the number of electrons flowing into the ITO region. When the number of electrons flowing into the ITO region reaches the desired value, the TFT device is turned off. At this time, the entire electrons are kept in the ITO region.

The figure above shows the time changes specified at each pixel point. G1 is continuously selected to be turned on by the driver IC from T1 to TN so that the source-driven IC charges TFT pixels on G1 in the order of D1, D2, and Dn. When TN +1, gATE-driven IC is selected G2 again, and source-driven IC is selected sequentially from D1.

The more vertical the Angle at which the LIQUID crystal stands, the more light will not be guided by the LIQUID crystal. Different liquid crystal standing angles will direct different amounts of light. From the above examples, the larger the angle at which the liquid crystal stands, the weaker the light that can be penetrated. (The direction of the upper and lower polarizer will determine the intensity of penetration, so as long as you understand the Angle of the liquid crystal standing will guide the intensity of light).

Undirected light is absorbed by the upper polarizer. Natural light is polarized in any direction. The function of the polarizer is to filter out most of the light oscillating in different directions and only allow light in a specific direction to pass through.

Many people don’t understand the differences between generations of TFT-LCD plants, but the principle is quite simple. The main difference between generations of plants is in the size of glass substrates, which are products cut from large glass substrates. Newer plants have larger glass substrates that can be cut to increase productivity and reduce costs, or to produce larger panels (such as TFT display LCD TV panels).

The TFT-LCD industry first emerged in Japan in the 1990s, when a process was designed and built in the country. The first-generation glass substrate is about 30 X 40 cm in size, about the size of a full-size magazine, and can be made into a 15-inch panel. By the time Acer Technology (which was later merged with Unioptronics to become AU Optronics) entered the industry in 1996, the technology had advanced to A 3.5 generation plant (G3.5) with glass substrate size of about 60 X 72 cm.Au Optronics has evolved to a sixth-generation factory (G6) process where the G6 glass substrate measures 150 X 185 cm, the size of a double bed. One G6 glass substrate can cut 30 15-inch panels, compared with the G3.5 which can cut 4 panels and G1 which can only cut one 15-inch panel, the production capacity of the sixth generation factory is enlarged, and the relative cost is reduced. In addition, the large size of the G6 glass substrate can be cut into large-sized panels, which can produce eight 32-inch LCD TV panels, increasing the diversity of panel applications. Therefore, the global TFT LCD manufacturers are all invested in the new generation of plant manufacturing technology.

The TRANSISTor-LCD is an acronym for thin-film TFT Display. Simply put, TFT-LCD panels can be seen as two glass substrates sandwiched between a layer of liquid crystal. The upper glass substrate is connected to a Color Filter, while the lower glass has transistors embedded in it. When the electric field changes through the transistor, the liquid crystal molecules deflect, so as to change the polarization of the light, and the polarizing film is used to determine the light and shade state of the Pixel. In addition, the upper glass is fitted to the color filter, so that each Pixel contains three colors of red, blue and green, which make up the image on the panel.

– The Array process in the front segment is similar to the semiconductor process, except that thin-film transistors are made on glass rather than silicon wafers.

– The middle Cell is based on the glass substrate of the front segment Array, which is combined with the glass substrate of the color filter, and liquid crystal (LC) is injected between the two glass substrates.

-The rear module assembly process is the production operation of assembling the glass after the Cell process with other components such as backlight plate, circuit, frame, etc.

The luminescence principle is tied to the vapor electroplating organic film between the transparent anode and the metal cathode. The electron and electric hole are injected, and the energy is converted into visible light by the composite between the organic film. And can match different organic materials, emit different colors of light, to achieve the requirements of the full-color display.

The organic light display can be divided into Passive Matrix (PMOLED) and Active Matrix (AMOLED) according to the driving mode. The so-called active driven OLED(AMOLED) can be visualized in the Thin Film Transistor (TFT) as a capacitor that stores signals to provide the ability to visualize the light in a grayscale.

Although the production cost and technical barriers of passive OLED are low, it is limited by the driving mode and the resolution cannot be improved. Therefore, the application product size is limited to about 5″, and the product will be limited to the market of low resolution and small size. For high precision and large picture, the active drive is mainly used. The so-called active drive is capacitive to store the signal, so when the scanning line is swept, the pixel can still maintain its original brightness. In the case of passive drive, only the pixels selected by the scan line are lit. Therefore, in an active-drive mode, OLED does not need to be driven to very high brightness, thus achieving better life performance and high resolution.OLED combined with TFT technology can realize active driving OLED, which can meet the current display market for the smoothness of screen playback, as well as higher and higher resolution requirements, fully display the above superior characteristics of OLED.

The technology to grow The TFT on the glass substrate can be amorphous Silicon (A-SI) manufacturing process and Low-Temperature Poly-Silicon (LTPS). The biggest difference between LTPS TFT and A-SI TFT is the difference between its electrical properties and the complicated manufacturing process. LTPS TFT has a higher carrier mobility rate, which means that TFT can provide more current, but its process is complicated.A-si TFT, on the other hand, although a-Si’s carrier movement rate is not as good as LTPS’s, it has a better competitive advantage in cost due to its simple and mature process.Au Optronics is the only company in the world that has successfully combined OLED with LTPS and A-SI TFT at the same time, making it a leader in active OLED technology.

Polysilicon is a silicon-based material about 0.1 to several um in size, composed of many silicon particles. In the semiconductor manufacturing industry, polysilicon should normally be treated by Low-Pressure Chemical Vapor Deposition. If the annealing process is higher than 900C, this method is known as SPC. Solid Phase Deposition. However, this method does not work in the flat display industry because the maximum temperature of the glass is only 650C. Therefore, LTPS technology is specifically applied to the manufacture of flat displays.

Let me suppose that it belongs to the SPC method. However, compared with traditional SPC, this method can produce polysilicon at low temperatures (about 500~600 C). This is because the thin layer of metal is coated before the formation of crystallization, and the metal composition plays an active role in reducing crystallization.

A method for direct deposition of Poly-film without vapor extraction. The sedimentation temperature may be below 300C. Growth mechanisms contain catalytic cracking reactions of SiH4-H2 mixtures.

This method is currently the most widely used. The Excimer laser is used for heating and melting A-SI. It contains low amounts of hydrogen and recrystallizes to Poly-film.

The LTPS membrane is much more complex than a-SI, yet the LTPS TFT is 100 times more mobile than A-SI TFT. And CMOS program can be carried out directly on a glass substrate. Here are some of the features that p-SI has over A-SI:

2. Vehicle for OLED: High mobility means that the OLED Device can provide a large driving current, so it is more suitable for an active OLED display substrate.

3. Compact module: As part of the drive circuit can be made on the glass substrate, the circuit on the PCB is relatively simple, thus saving the PCB area.

MVA technology not only improves the panel view but also solves most of the problems of gray-scale inversion due to the special arrangement mode of liquid crystals.

LCD screens are backlit to project images through color filters before they are reflected in our eye Windows. This mode of carrying backlit LCD screens, known as “penetrating” LCD screens, consumes most of the power through backlit devices. The brighter the backlight, the brighter it will appear in front of the screen, but the more power it will consume.

The “reflective” architecture USES an external light source to display the image via a reflector, which saves electricity but is harder to see in the absence of an external light source.

“Half penetration and half reflection” is the compromise between the two. The device USES a half mirror instead of the reflector, which can not only pass through the backlight but also use the reflection from the external light source to achieve the effect of saving electricity, increasing brightness, and reducing weight.

Different from the traditional manufacturing process, COG technology directly assumes the drive IC on the glass substrate. The advantages of this technology include:

ODF process is an epoch-making manufacturing method, which is time-consuming, low yield, and difficult to achieve in the past. Such as the production of large panels of TV products, in response to the rapid response of small Gap panels, or advanced high-quality MVA panels, using ODF process technology, the problem can be readily solved.

using the ODF process, we no longer need a vacuum tempering process, LIQUID crystal injection machine, sealing machine, and panel cleaning equipment after sealing.

Generally speaking, in the ODF process, the use efficiency of a LIQUID crystal is more than 95%, but compared with 60% of the traditional process, it can fully save more than 35% of the cost of liquid crystal materials. It can also save water, electricity, gas, and lotion when cleaning sealant and related panels.

The manufacturing process saved is originally the most time-consuming and time-consuming process in the traditional manufacturing process. Moreover, with the trend of large-scale panels, or high-quality panels of small Cell Gap, the time will be longer. Traditionally, Cell processes take at least three days to complete, but ODF processes take less than one day.

If you want to buy a new monitor, you might wonder what kind of display technologies I should choose. In today’s market, there are two main types of computer monitors: TFT LCD monitors & IPS monitors.

The word TFT means Thin Film Transistor. It is the technology that is used in LCD displays.  We have additional resources if you would like to learn more about what is a TFT Display. This type of LCDs is also categorically referred to as an active-matrix LCD.

These LCDs can hold back some pixels while using other pixels so the LCD screen will be using a very minimum amount of energy to function (to modify the liquid crystal molecules between two electrodes). TFT LCDs have capacitors and transistors. These two elements play a key part in ensuring that the TFT display monitor functions by using a very small amount of energy while still generating vibrant, consistent images.

Industry nomenclature: TFT LCD panels or TFT screens can also be referred to as TN (Twisted Nematic) Type TFT displays or TN panels, or TN screen technology.

IPS (in-plane-switching) technology is like an improvement on the traditional TFT LCD display module in the sense that it has the same basic structure, but has more enhanced features and more widespread usability.

These LCD screens offer vibrant color, high contrast, and clear images at wide viewing angles. At a premium price. This technology is often used in high definition screens such as in gaming or entertainment.

Both TFT display and IPS display are active-matrix displays, neither can’t emit light on their own like OLED displays and have to be used with a back-light of white bright light to generate the picture. Newer panels utilize LED backlight (light-emitting diodes) to generate their light hence utilizing less power and requiring less depth by design. Neither TFT display nor IPS display can produce color, there is a layer of RGB (red, green, blue) color filter in each LCD pixels to produce the color consumers see. If you use a magnifier to inspect your monitor, you will see RGB color in each pixel. With an on/off switch and different level of brightness RGB, we can get many colors.

Wider viewing angles are not always welcome or needed. Image you work on the airplane. The person sitting next to you always looking at your screen, it can be very uncomfortable. There are more expensive technologies to narrow the viewing angle on purpose to protect the privacy.

Winner. IPS TFT screens have around 0.3 milliseconds response time while TN TFT screens responds around 10 milliseconds which makes the latter unsuitable for gaming

Winner. the images that IPS displays create are much more pristine and original than that of the TFT screen. IPS displays do this by making the pixels function in a parallel way. Because of such placing, the pixels can reflect light in a better way, and because of that, you get a better image within the display.

As the display screen made with IPS technology is mostly wide-set, it ensures that the aspect ratio of the screen would be wider. This ensures better visibility and a more realistic viewing experience with a stable effect.

Winner. While the TFT LCD has around 15% more power consumption vs IPS LCD, IPS has a lower transmittance which forces IPS displays to consume more power via backlights. TFT LCD helps battery life.

Normally, high-end products, such as Apple Mac computer monitors and Samsung mobile phones, generally use IPS panels. Some high-end TV and mobile phones even use AMOLED (Active Matrix Organic Light Emitting Diodes) displays. This cutting edge technology provides even better color reproduction, clear image quality, better color gamut, less power consumption when compared to LCD technology.

What you need to choose is AMOLED for your TV and mobile phones instead of PMOLED. If you have budget leftover, you can also add touch screen functionality as most of the touch nowadays uses PCAP (Projective Capacitive) touch panel.

This kind of touch technology was first introduced by Steve Jobs in the first-generation iPhone. Of course, a TFT LCD display can always meet the basic needs at the most efficient price. An IPS display can make your monitor standing out.

Steven Van Slyke and Ching Wan Tang pioneered the organic OLED at Eastman Kodak in 1979. The first OLED product was a display for a car stereo, commercialized by Pioneer in 1997. Kodak’s EasyShare LS633 digital camera, introduced in 2003, was the first consumer electronic product incorporating a full-color OLED display. The first television featuring an OLED display, produced by Sony, entered the market in 2008. Today, Samsung uses OLEDs in all of its smartphones, and LG manufactures large OLED screens for premium TVs. Other companies currently incorporating OLED technology include Apple, Google, Facebook, Motorola, Sony, HP, Panasonic, Konica, Lenovo, Huawei, BOE, Philips and Osram. The OLED display market is expected to grow to $57 billion in 2026.

AMOLED (Active Matrix Organic Light Emitting Diode) is a type of OLED display device technology. OLED is a type of display technology in which organic material compounds form the electroluminescent material, and active matrix is the technology behind the addressing of individual pixels.

An AMOLED display consists of an active matrix of OLED pixels generating light (luminescence) upon electrical activation that have been deposited or integrated onto a thin-film transistor (TFT) array, which functions as a series of switches to control the current flowing to each individual pixel.

Typically, this continuous current flow is controlled by at least two TFTs at each pixel (to trigger the luminescence), with one TFT to start and stop the charging of a storage capacitor and the second to provide a voltage source at the level needed to create a constant current to the pixel, thereby eliminating the need for the very high currents required for PMOLED.

TFT backplane technology is crucial in the fabrication of AMOLED displays. In AMOLEDs, the two primary TFT backplane technologies, polycrystalline silicon (poly-Si) and amorphous silicon (a-Si), are currently used offering the potential for directly fabricating the active-matrix backplanes at low temperatures (below 150 °C) onto flexible plastic substrates for producing flexible AMOLED displays. Brightness of AMOLED is determined by the strength of the electron current. The colors are controlled by the red, green and blue light emitting diodes.  It is easier to understand by thinking of each pixel is independently colored, mini-LED.

IPS technology is like an improvement on the traditional TFT LCD display module in the sense that it has the same basic structure, but with more enhanced features and more widespread usability compared with the older generation of TN type TFT screen (normally used for low-cost computer monitors). Actually, it is called super TFT.  IPS LCD display consists of the following high-end features. It has much wider viewing angles, more consistent, better color in all viewing directions, it has higher contrast, faster response time. But IPS screens are not perfect as their higher manufacturing cost compared with TN TFT LCD.

Utilizing an electrical charge that causes the liquid crystal material to change their molecular structure allowing various wavelengths of backlight to “pass-through”. The active matrix of the TFT display is in constant flux and changes or refreshes rapidly depending upon the incoming signal from the control device.

Offering you a complete choice of products which include Si TFT Active Matrix LCD, 3.5" Active Matrix LCD Panel, 7" Amorphous Transmissive Tft LCD Screen, 6.7" Amorphous Si TFT Color LCD Module, PQ 3Qi-01 is a 10.1" TFT Liquid Crystal Display and TFT LCD Panel 3.45.

A si TFT active matrix LCD of 7"(diagonal dimensions) with a resolution of 800*3(RGB)*480. Features include white LED backlight and VGA and Video input.The signal interface is parallel RGB(1ch,6-bit) with wide range of display colors of 262K.

It features Transmissive type and back-light with six LEDS(Serial type) with support resolution of n 320xRGBx240 (16.7M Color) which includes 24bit parallel RGB Interface (8bit x 3).

A070VW04_V1 is an amorphous transmissive type TFT (Thin Film Transistor) LCD (Liquid crystal Display). This model is composed of TFT-LCD, driver IC, FPC (flexible printed circuit), and backlight unit.

This color LCD module is composed of amorphous silicon thin film transistor liquid crystal display panel structure with driver LSis for driving the TFT array and a backlight.Color (Red,Green,Blue) data signals from a host system e.g. signal generator are modulated into the best form for active matrix system by signal processing board, and sent to the driver LSIs which drive the individual TFT arrays.

This 10.1” TFT Liquid Crystal Display module supports 1024 x RGB x 600 Wide-SVGA (WSVGA) mode and can display 262,144 colors.This module also supports two low power modes: a transflective mode with lower color and a reflective black and white (64 grayscales) mode. In reflective mode the screens shows higher resolution at 3072 x 600 pixels, in transflective mode the color resolution is 1024 x RGB x 600, while the black/white/grey resolution is 3072 x 600. The converter module for the LED backlight is built in.

3.45“ color TFT-LCD panel. The 3.45“ color TFT-LCD panel is designed for camcorder, digital camera application and other electronic products which require high quality flat panel displays. This module follows RoHS.Added features include High Resolution :230,400 Dots (320 RGB x 240) . Image Reversion: Up/Down and Left/Right.